Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modelin
n&k CD (nm) Uniformity Map Figure 20. n&k Depth (nm) Uniformity Map | Download Scientific Diagram
Contact local CD uniformity optimization through etch shrink
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
Intel and Nikon Litho Specialists Discuss Overlay Matching and Edge Placement Error for Production Beyond 20 nm
Process Setup and Optimization • LithExx-Systems
CD uniformity maps obtained using the optical technique described... | Download Scientific Diagram
A study of AA CD uniformity loading optimization at 28nm node | Semantic Scholar
In-field CD uniformity (CDU) of 32nm HP L/S pattern. | Download Scientific Diagram
Photomask
a) Across wafer CD uniformity for 110 nm wide (nominal) feature after... | Download Scientific Diagram
Global CD uniformity measurement based on 15 points on a reticle. 5 The... | Download Scientific Diagram
The Global Variation of Photoresist Topography and CD Uniformity due to Local High Step
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Critical Dimension Control and its Implications in IC Performance - ppt download
CD uniformity at pitch 80nm after a/litho and b/etch for negative tone... | Download Scientific Diagram
Measured CD Uniformity for Conventional Method and New Method.... | Download Scientific Diagram
슬라이드 1
슬라이드 1
Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration - ScienceDirect
Process Setup and Optimization • LithExx-Systems
Global CD uniformity measurement based on 64 points on a test mask.... | Download Scientific Diagram
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
Extreme ultraviolet lithography reticle local CD uniformity correlation to wafer local CD uniformity
